Polymeric self-assembled mono- and multilayers and their use in photolithography
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A self-assembled multilayer and in particular polymeric self-assembled multilayer can be effectively produced from two or more self-assembled monolayers on a substrate where each of the self-assembled monolayers is produced for a block containing a first functional group and a second functional group where the second functional group is reacted with the first functional group. The production of polymerizable, self-assembled mono- and multi-layers from, e.g., blocks containing at least two acetylene groups and/or polymerizable end groups, is also provided. The polymerized mono- or multilayer can be employed in a variety of applications including photolithography.
Crooks, Richard M.; Kim, Taisun; Chan, Kwok-Chu; Schoer, Jonathan K. (1999). Polymeric self-assembled mono- and multilayers and their use in photolithography. United States. Patent and Trademark Office; Texas A&M University. Libraries. Available electronically from