Browsing by Subject "428/420"

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    • Polymeric self-assembled mono- and multilayers and their use in photolithography 
      Crooks, Richard M.; Kim, Taisun; Chan, Kwok-Chu; Schoer, Jonathan K. (United States. Patent and Trademark Office; Texas A&M University. Libraries, 1999-03-23)
      A self-assembled multilayer and in particular polymeric self-assembled multilayer can be effectively produced from two or more self-assembled monolayers on a substrate where each of the self-assembled monolayers is produced ...