Quantum lithography with classical light: Generation of arbitrary patterns

dc.creator	Sun, Qingqing
dc.creator	Hemmer, Philip R.
dc.creator	Zubairy, M. Suhail
dc.date.accessioned	2011-09-08T21:36:27Z
dc.date.available	2011-09-08T21:36:27Z
dc.date.issued	2007
dc.identifier.citation	Qingqing Sun, Philip R. Hemmer and M. Suhail Zubairy. Phys.Rev.A 75 065803 2007. "Copyright (2007) by the American Physical Society."	en
dc.identifier.uri	http://dx.doi.org/10.1103/PhysRevA.75.065803
dc.identifier.uri	https://hdl.handle.net/1969.1/126608
dc.description	Journals published by the American Physical Society can be found at http://publish.aps.org/	en
dc.description.abstract	Based on our previous scheme [Hemmer , Phys. Rev. Lett. 96, 163603 (2006)] we show the procedures to obtain any one- or two-dimensional pattern by multiple exposures. A key modification to the resonance condition is made to achieve subwavelength pattern resolution. The level separation of the substrate does not pose an upper limit to the frequency summation. So the fundamental frequency can be high and the number of Fourier terms can be large, making our scheme very suitable for subwavelength arbitrary patterns.	en
dc.language.iso	en
dc.publisher	American Physical Society
dc.subject	OPTICAL LITHOGRAPHY	en
dc.subject	RAYLEIGH RESOLUTION	en
dc.subject	LIMIT	en
dc.subject	BEAT	en
dc.subject	Optics	en
dc.subject	Physics	en
dc.title	Quantum lithography with classical light: Generation of arbitrary patterns	en
dc.type	Article	en
local.department	Physics and Astronomy	en