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    Quantum lithography with classical light: Generation of arbitrary patterns

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    PhysRevA.75.065803.pdf (832.1Kb)
    Date
    2007
    Author
    Sun, Qingqing
    Hemmer, Philip R.
    Zubairy, M. Suhail
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    Abstract
    Based on our previous scheme [Hemmer , Phys. Rev. Lett. 96, 163603 (2006)] we show the procedures to obtain any one- or two-dimensional pattern by multiple exposures. A key modification to the resonance condition is made to achieve subwavelength pattern resolution. The level separation of the substrate does not pose an upper limit to the frequency summation. So the fundamental frequency can be high and the number of Fourier terms can be large, making our scheme very suitable for subwavelength arbitrary patterns.
    URI
    http://dx.doi.org/10.1103/PhysRevA.75.065803
    http://hdl.handle.net/1969.1/126608
    Description
    Journals published by the American Physical Society can be found at http://publish.aps.org/
    Subject
    OPTICAL LITHOGRAPHY
    RAYLEIGH RESOLUTION
    LIMIT
    BEAT
    Optics
    Physics
    Department
    Physics and Astronomy
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    Citation
    Qingqing Sun, Philip R. Hemmer and M. Suhail Zubairy. Phys.Rev.A 75 065803 2007. "Copyright (2007) by the American Physical Society."

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