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dc.contributor.advisorWeichold, Mark H.
dc.creatorKarunatileka, Muditha A.
dc.date.accessioned2022-04-01T14:05:36Z
dc.date.available2022-04-01T14:05:36Z
dc.date.issued1986
dc.identifier.urihttps://hdl.handle.net/1969.1/CAPSTONE-KarunatilekaM_1986
dc.descriptionProgram year: 1985/1986en
dc.descriptionDigitized from print original stored in HDRen
dc.description.abstractA novel method for making discretionary interconnections involves direct writing on wafer using a precision laser beam and metallization using the lift off process. After experimenting with several line thicknesses, developing times (for lift off), laser power densities and speeds, I succeeded in creating arbitrary interconnections from metal to metal, metal to diffusion and metal to polysilicon on a test structure. The feasibility of step coverage was also investigated. These results are extremely encouraging from a technical standpoint and recommendations are made which would improve this work through further research.en
dc.format.extent34 pagesen
dc.format.mediumelectronicen
dc.format.mimetypeapplication/pdf
dc.subjectdiscretionary interconnectionsen
dc.subjectprecision laser beamen
dc.subjectmetallizationen
dc.titleDirect Write Laser Lithography For Discretionary Interconnectionsen
dc.title.alternativeDIRECT WRITE LASER LITHOGRAPHY FOR DISCRETIONARY INTERCONNECTIONSen
dc.typeThesisen
thesis.degree.departmentElectrical Engineeringen
thesis.degree.grantorUniversity Undergraduate Fellowen
thesis.degree.levelUndergraduateen
dc.type.materialtexten


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