Amorphous silicon oxide, amorphous silicon oxynitride, and amorphous silicon nitride thin films and uses thereof
Abstract
Amorphous SiOx (SiO2), SiONx, silicon nitride (Si3N4), surface treatments are provided, on both metal (titanium) and non-metal surfaces. Amorphous silicon-film surface treatments are shown to enhance osteoblast and osteoblast progenitor cell bioactivity, including biomineral formation and osteogenic gene panel expression, as well as enhanced surface hydroxyapatite (HA) formation. A mineralized tissue interface is provided using the amorphous silicon-based surface treatments in the presence of osteoblasts, and provides improved bone cell generation/repair and improved interface for secure attachment/bonding to bone. Methods for providing PEVCD-based silicon overlays onto surfaces are provided. Methods of increasing antioxidant enzyme (e.g., superoxide dismutase) expression at a treated surface for enhanced healing are also provided. Continuous generation and release of Si4+ ion into an in vitro or in vivo environment in the presence of osteoblasts/osteoblast progenitor cells, methods of employing same for enhancing the rate of bone healing/bone regeneration, is also described.
Subject
A61L 31/088A61L 31/16
C23C 16/0281
C23C 16/401
C23C 16/308
A61L 2430/02
A61L 2420/02
A61L 2300/102
A61L 2400/18
A61L 2300/412
Collections
Citation
Varanasi, Venu; Aswath, Pranesh; Maginot, Megen; Lavrick, Nickolay V. (2021). Amorphous silicon oxide, amorphous silicon oxynitride, and amorphous silicon nitride thin films and uses thereof. United States. Patent and Trademark Office; Texas A&M University. Libraries. Available electronically from https : / /hdl .handle .net /1969 .1 /193356.