The role of Frenkel defect diffusion in dynamic annealing in ion-irradiated Si
dc.creator | J. B. Wallace | |
dc.creator | L. B. Bayu Aji | |
dc.creator | A. A. Martin | |
dc.creator | S. J. Shin | |
dc.creator | L. Shao | |
dc.creator | S. O. Kucheyev | |
dc.date.accessioned | 2019-10-15T15:30:29Z | |
dc.date.available | 2019-10-15T15:30:29Z | |
dc.date.issued | 2017 | |
dc.identifier.issn | 2045-2322 | |
dc.identifier.uri | https://hdl.handle.net/1969.1/183692 | |
dc.format.extent | 0 | en |
dc.publisher | Scientific Reports | |
dc.relation.ispartof | 1foldr Import 2019-10-08 Batch 12 | en |
dc.relation.uri | 10.1038/srep39754 | en |
dc.title | The role of Frenkel defect diffusion in dynamic annealing in ion-irradiated Si | en |