Mixed-RKDG Finite Element Methods for the 2-D Hydrodynamic Model for Semiconductor Device Simulation
dc.creator | Chen, Zhangxin | |
dc.creator | Cockburn, Bernardo | |
dc.creator | Jerome, Joseph W. | |
dc.creator | Shu, Chi-Wang | |
dc.date.accessioned | 2019-10-09T18:50:58Z | |
dc.date.available | 2019-10-09T18:50:58Z | |
dc.date.issued | 1995 | |
dc.identifier.issn | 1026-7123 | |
dc.identifier.issn | 1065-514X | |
dc.identifier.issn | 1563-5171 | |
dc.identifier.uri | https://hdl.handle.net/1969.1/181230 | |
dc.format.extent | 13 | en |
dc.publisher | VLSI Design | |
dc.relation.ispartof | 1foldr Import 2019-10-08 Batch 6 | en |
dc.relation.uri | 10.1155/1995/47065 | en |
dc.title | Mixed-RKDG Finite Element Methods for the 2-D Hydrodynamic Model for Semiconductor Device Simulation | en |