Electronic and vibrational properties of ultrathin Si O 2 films grown on Mo(112)
dc.creator | Wendt, S. | |
dc.creator | Ozensoy, E. | |
dc.creator | Wei, T. | |
dc.creator | Frerichs, M. | |
dc.creator | Cai, Y. | |
dc.creator | Chen, M. S. | |
dc.creator | Goodman, D. W. | |
dc.date.accessioned | 2019-10-09T16:19:15Z | |
dc.date.available | 2019-10-09T16:19:15Z | |
dc.date.issued | 2005 | |
dc.identifier.issn | 1098-0121 | |
dc.identifier.issn | 1550-235X | |
dc.identifier.uri | https://hdl.handle.net/1969.1/180426 | |
dc.format.extent | 0 | en |
dc.publisher | Physical Review B - Condensed Matter and Materials Physics | |
dc.relation.ispartof | 1foldr Import 2019-10-08 Batch 5 | en |
dc.relation.uri | 10.1103/PhysRevB.72.115409 | en |
dc.title | Electronic and vibrational properties of ultrathin Si O 2 films grown on Mo(112) | en |