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dc.creatorLi, Hebin
dc.creatorSautenkov, Vladimir A.
dc.creatorKash, Michael M.
dc.creatorSokolov, Alexei V.
dc.creatorWelch, George R.
dc.creatorRostovtsev, Yuri V.
dc.creatorZubairy, M. Suhail
dc.creatorScully, Marlan O.
dc.date.accessioned2011-09-08T21:36:31Z
dc.date.available2011-09-08T21:36:31Z
dc.date.issued2008
dc.identifier.citationHebin Li, Vladimir A. Sautenkov, Michael M. Kash, Alexei V. Sokolov, George R. Welch, Yuri V. Rostovtsev, M. Suhail Zubairy and Marlan O. Scully. Phys.Rev.A 78 013803 2008. "Copyright (2008) by the American Physical Society."en
dc.identifier.urihttp://dx.doi.org/10.1103/PhysRevA.78.013803
dc.identifier.urihttps://hdl.handle.net/1969.1/126621
dc.descriptionJournals published by the American Physical Society can be found at http://publish.aps.org/en
dc.description.abstractWe study the possibility of creating spatial patterns having subwavelength size by using the so-called dark states formed by the interaction between atoms and optical fields. These optical fields have a specified spatial distribution. Our experiments in Rb vapor display spatial patterns that are smaller than the length determined by the diffraction limit of the optical system used in the experiment. This approach may have applications to interference lithography and might be used in coherent Raman spectroscopy to create patterns with subwavelength spatial resolution.en
dc.language.isoen
dc.publisherAmerican Physical Society
dc.subjectELECTROMAGNETICALLY INDUCED TRANSPARENCYen
dc.subjectPOSITION MEASUREMENTen
dc.subjectFIELDSen
dc.subjectNANOLITHOGRAPHYen
dc.subjectSPECTROSCOPYen
dc.subjectLOCALIZATIONen
dc.subjectLITHOGRAPHYen
dc.subjectOpticsen
dc.subjectPhysicsen
dc.titleOptical imaging beyond the diffraction limit via dark states RID A-8711-2009en
dc.typeArticleen
local.departmentPhysics and Astronomyen


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