Browsing by Author "Liao, Zeyang"
Now showing items 1-8 of 8
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Liao, Zeyang; Nha, Hyunchul; Zubairy, M. Suhail (Physical Review A - Atomic, Molecular, and Optical Physics, 2016)
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Liao, Zeyang (2014-07-28)The resolution of traditional optical microscope and optical lithography is limited by about half wavelength of the light source, which is well known as the diffraction limit or Abbe limit. The resolution limit is due to ...
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Hu, Li-Yun; Liao, Zeyang; Ma, Shengli; Zubairy, M. Suhail (Physical Review A - Atomic, Molecular, and Optical Physics, 2016)
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Liao, Zeyang; Al-amri M.; Zubiary, Suhail M. (United States. Patent and Trademark Office; Texas A&M University. Libraries, 2015-04-14)Preservation of quantum entanglement in a two-qubit system is achieved by use of the disclosed systems. Three different example two-qubit systems are shown: (1) a system employing a weak measurement, (2) a system in which ...
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Zubairy, Muhammad Suhail; Liao, Zeyang; Al-amri, Mohammad D. (United States. Patent and Trademark Office; Texas A&M University. Libraries, 2015-11-10)The resonance fluorescence spectrum of a number of two-level atoms is driven by a gradient coherent laser field. In the weak dipole-dipole interaction region (separation less than λ/50), a very strong laser field may be ...
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Single-photon transport through an atomic chain coupled to a one-dimensional nanophotonic waveguide Liao, Zeyang; Zeng, Xiaodong; Zhu, Shi-Yao; Zubairy, M. Suhail (Physical Review A - Atomic, Molecular, and Optical Physics, 2015)
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Al-Amri, Mohammad D.; Liao, Zeyang; Zubiary, Muhammad Suhail (United States. Patent and Trademark Office; Texas A&M University. Libraries, 2013-09-24)A sub-wavelength photolithographic method includes exposing a photoresist material to a stimulating electromagnetic source prior to further exposing the photoresist material to a dissociating electromagnetic source. The ...
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Zubairy, Muhammad Suhail; Liao, Zeyang; Al-amri, Mohammad D. (United States. Patent and Trademark Office; Texas A&M University. Libraries, 2013-11-05)A sub-wavelength photolithographic method includes exposing a photoresist material to a stimulating electromagnetic source prior to further exposing the photoresist material to a dissociating electromagnetic source. The ...