Show simple item record

dc.contributor.advisorSchweikert, Emile A.
dc.creatorSummers, William Russell
dc.descriptionTypescript (photocopy).en
dc.description.abstractThe feasibility of utilizing ²⁵²Cf-Particle Desorption Mass Spectrometry (PDMS) to characterize the surface region of solid samples has been evaluated. The PDMS experiment was adapted to an ultrahigh vacuum (UHV) environment and was configured so as to allow the analysis of thick as well as thin samples. This apparatus included an in situ sputter cleaning/depth profiling facility. The mass resolution was variable from 300 to 200 at 133 daltons by changing the drift length from 27 cm to 20 cm. Desorbed ions were focused by using either a dual grid assembly or an einzel lens. The overall instrumental transmission efficiency with the einzel lens operative was approximately 50%. The applicability of ²⁵²Cf-PDMS to samples that were thick and insulating was demonstrated in the analysis of geological specimens. Pollucite, Microcline, Amblygonite, and Lepidolite were analyzed without complications associated with sample thickness or charge accumulation. Substitution occurring between the alkali metals in the environment was observed by PDMS and was corroborated by SIMS, XPS, and EMP analyses. The analysis of NBM SRM glasses addressed the suitability of combining the PDMS technique with sputter etching. This application demonstrated the ability of this technique to sense changes in the chemical environment brought about by sputter cleaning. The analysis of these samples also allowed the estimation of detection limits for lithium, rubidium, and cesium in a glass matrix as 300 ppm, 400 ppm, and 400 ppm, respectively. Sputter depth profiling combined with ²⁵²Cf-PDMS analysis of an aluminum layer on a silicon substrate established the utility of the PDMS technique in surface characterization. The information depth was shown to be less than 30 Å and may be as shallow as 1-3 monolayers for this system. These observations were validated by XPS analysis of the Al/Si sample.en
dc.format.extentxv, 157 leavesen
dc.rightsThis thesis was part of a retrospective digitization project authorized by the Texas A&M University Libraries. Copyright remains vested with the author(s). It is the user's responsibility to secure permission from the copyright holder(s) for re-use of the work beyond the provision of Fair Use.en
dc.subjectMajor chemistryen
dc.subject.classification1986 Dissertation S955
dc.subject.lcshSurfaces (Technology)en
dc.subject.lcshSurface chemistryen
dc.titleParticle desorption mass spectrometric surface characterizationen
dc.typeThesisen A&M Universityen of Philosophyen D. in Chemistryen
dc.contributor.committeeMemberAhr, Wayne M.
dc.contributor.committeeMemberRowe, Marvin W.
dc.contributor.committeeMemberRussell, David H.
dc.format.digitalOriginreformatted digitalen
dc.publisher.digitalTexas A&M University. Libraries

Files in this item


This item appears in the following Collection(s)

Show simple item record

This item and its contents are restricted. If this is your thesis or dissertation, you can make it open-access. This will allow all visitors to view the contents of the thesis.

Request Open Access