dc.creator | Staack, David | |
dc.creator | Tsai, Tsung-chan | |
dc.date.accessioned | 2019-06-17T17:09:13Z | |
dc.date.available | 2019-06-17T17:09:13Z | |
dc.date.issued | 2014-12-30 | |
dc.identifier.uri | https://hdl.handle.net/1969.1/177089 | |
dc.description.abstract | A method and apparatus for depositing a film on a biological substrate are provided. A plasma generation device includes a dielectric conduit and a high voltage electrode. The plasma generation device is placed in proximity to the biological substrate and a gas supply that includes a precursor material is directed through the dielectric conduit. An electric field generated by the potential difference between the high voltage electrode and the biological substrate ionizes at least a portion of the gas supply and causes plasma to emanate from the dielectric conduit and contact the biological substrate. The plasma induces a reaction of the precursor material to form a film that is deposited on the biological substrate. | en |
dc.language | eng | |
dc.publisher | United States. Patent and Trademark Office | |
dc.rights | Public Domain (No copyright - United States) | en |
dc.rights.uri | http://rightsstatements.org/vocab/NoC-US/1.0/ | |
dc.title | Plasma treatment and plasma enhanced chemical vapor deposition onto temperature sensitive biological materials | en |
dc.type | Utility patent | en |
dc.format.digitalOrigin | reformatted digital | en |
dc.description.country | US | |
dc.contributor.assignee | The Texas A&M University System | |
dc.identifier.patentapplicationnumber | 13/440615 | |
dc.subject.uspcprimary | 604/24 | |
dc.subject.uspcother | 607/2 | |
dc.date.filed | 2012-04-05 | |
dc.publisher.digital | Texas A&M University. Libraries | |
dc.subject.cpcprimary | B05D 1/62 | |
dc.subject.cpcprimary | A61L 2/14 | |
dc.subject.cpcprimary | C23C 16/52 | |
dc.subject.cpcprimary | C23C 16/06 | |
dc.subject.cpcprimary | C23C 16/503 | |
dc.subject.cpcprimary | A61B 18/042 | |
dc.subject.cpcprimary | A61L 2202/11 | |