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Method of producing a silicon film with micropores

dc.creatorParker, Donald L.
dc.creatorHall, Kenneth R.
dc.creatorHolste, James C.
dc.date.accessioned2019-06-17T17:03:30Z
dc.date.available2019-06-17T17:03:30Z
dc.date.issued1989-01-31
dc.identifier.urihttps://hdl.handle.net/1969.1/176886
dc.description.abstractThe present invention relates to a method of producing micropores having diameters of less than 20 nanometers in straight sides in silicon film. The silicon film produced by this process may be attached to a substrate material and used as a filter in molecular separation processes.en
dc.languageeng
dc.publisherUnited States. Patent and Trademark Office
dc.rightsPublic Domain (No copyright - United States)en
dc.rights.urihttp://rightsstatements.org/vocab/NoC-US/1.0/
dc.titleMethod of producing a silicon film with microporesen
dc.typeUtility patenten
dc.format.digitalOriginreformatted digitalen
dc.description.countryUS
dc.contributor.assigneeThe Texas A&M University System
dc.identifier.patentapplicationnumber07/136984
dc.subject.uspcprimary210/500.21
dc.subject.uspcother257/E21.215
dc.subject.uspcother257/E21.309
dc.subject.uspcother264/42
dc.subject.uspcother264/45.6
dc.subject.uspcother264/46.4
dc.subject.uspcother264/DIG.48
dc.date.filed1987-12-23
dc.publisher.digitalTexas A&M University. Libraries
dc.subject.cpcprimaryB01D 67/0065
dc.subject.cpcprimaryB01D 67/0072
dc.subject.cpcprimaryB01D 71/02
dc.subject.cpcprimaryC25D 11/32
dc.subject.cpcprimaryH01L 21/0203
dc.subject.cpcprimaryH01L 21/32134
dc.subject.cpcprimaryY10S 264/48
dc.subject.cpcprimaryB01D 2323/283
dc.subject.cpcprimaryB01D 2325/02


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