Method of producing a silicon film with micropores
Abstract
The present invention relates to a method of producing micropores having diameters of less than 20 nanometers in straight sides in silicon film. The silicon film produced by this process may be attached to a substrate material and used as a filter in molecular separation processes.
Subject
210/500.21257/E21.215
257/E21.309
264/42
264/45.6
264/46.4
264/DIG.48
B01D 67/0065
B01D 67/0072
B01D 71/02
C25D 11/32
H01L 21/0203
H01L 21/32134
Y10S 264/48
B01D 2323/283
B01D 2325/02
Collections
Citation
Parker, Donald L.; Hall, Kenneth R.; Holste, James C. (1989). Method of producing a silicon film with micropores. United States. Patent and Trademark Office; Texas A&M University. Libraries. Available electronically from https : / /hdl .handle .net /1969 .1 /176886.