The design and manufacture of a novel thin-film microelectronic vacuum diode structure
Abstract
The need for a new microelectronics technology that answers some of the limitations of current semiconductor based technology can no longer be ignored. To this end, vacuum microelectronics based on cold field emission has been explored as an alternative to the silicon transistor. To date, these approaches have been plagued with design-related problems that have retarded their acceptance as a viable technology. This work proposes a new vacuum diode structure, novel in its design. It can be easily expanded to multi-electrode structures, and has application in flat-panel display technology. A process for the manufacture of such a diode is developed herein. Diodes of various sizes are subsequently manufactured and tested. Test results indicate that the devices follow the Fowler-Nordheim model for cold field emission, suggesting successful operation. Suggestions for future work in this area axe discussed, including triode development and application to flat panel displays.
Description
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Includes bibliographical references.
Includes bibliographical references.
Keywords
electrical engineering., Major electrical engineering.