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    Doped tantalum oxide high K dielectric thin films 

    Donnelly, Joseph Patrick (Texas A&M University, 2000)
    To support the next generation of sub 100nm ULSI devices, a new high dielectric constant (K) thin film material must be developed. To reach these new smaller dimensions, thermally grown silicon dioxide would need to ...

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    AuthorDonnelly, Joseph Patrick (1)Subjectelectrical engineering (1)
    Major electrical engineering (1)
    ... View MoreDate Issued2000 (1)Has File(s)Yes (1)
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