Plasma treatment and plasma enhanced chemical vapor deposition onto temperature sensitive biological materials
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A method and apparatus for depositing a film on a biological substrate are provided. A plasma generation device includes a dielectric conduit and a high voltage electrode. The plasma generation device is placed in proximity to the biological substrate and a gas supply that includes a precursor material is directed through the dielectric conduit. An electric field generated by the potential difference between the high voltage electrode and the biological substrate ionizes at least a portion of the gas supply and causes plasma to emanate from the dielectric conduit and contact the biological substrate. The plasma induces a reaction of the precursor material to form a film that is deposited on the biological substrate.
Staack, David; Tsai, Tsung-chan (2016). Plasma treatment and plasma enhanced chemical vapor deposition onto temperature sensitive biological materials. United States. Patent and Trademark Office; Texas A&M University. Libraries. Available electronically from