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dc.creatorAl-amri, Mohammad D.
dc.creatorLiao, Zeyang
dc.creatorZubiary, Muhammad Suhail
dc.date.accessioned2019-06-17T17:07:51Z
dc.date.available2019-06-17T17:07:51Z
dc.date.issued2013-09-24
dc.identifier.urihttp://hdl.handle.net/1969.1/177044
dc.description.abstractA sub-wavelength photolithographic method includes exposing a photoresist material to a stimulating electromagnetic source prior to further exposing the photoresist material to a dissociating electromagnetic source. The stimulating electromagnetic source induces Rabi oscillations in the photoresist material between a first molecular state and an excited molecular state. The subsequent exposure of the photoresist material to the dissociating electromagnetic source dissociates only those molecules that are in the excited state, altering the properties of the photoresist material in zones of excited state molecules. The resulting patterns therefore depend on the spatial distribution of the zones of excited state molecules induced by the stimulating electromagnetic source. The properties of the stimulating electromagnetic source are controlled to achieve a desired spatial distribution of zones of excited state molecules of the photoresist material.en
dc.languageeng
dc.publisherUnited States. Patent and Trademark Office
dc.rightsPublic Domain (No copyright - United States)en
dc.rights.urihttp://rightsstatements.org/vocab/NoC-US/1.0/
dc.titleSub-wavelength lithography via Rabi oscillationsen
dc.typeUtility patenten
dc.format.digitalOriginreformatted digitalen
dc.description.countryUS
dc.contributor.assigneeThe Texas A&M University System
dc.contributor.assigneeKing Abdulaziz City for Science and Technology
dc.identifier.patentapplicationnumber13/270597
dc.subject.uspcprimary430/322
dc.subject.uspcother430/394
dc.date.filed2011-10-11
dc.publisher.digitalTexas A&M University. Libraries


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