Now showing items 1-1 of 1

    • Tewg, Jun-Yen (Texas A&M University, 2005-02-17)
      A new high-k dielectric material, i.e., zirconium-doped tantalum oxide (Zr-doped TaOx), in the form of a sputter-deposited thin film with a thickness range of 5-100 nm, has been studied. Important applications of this new ...