Now showing items 1-6 of 6

    • Advanced Photoresist Technologies by Intricate Molecular Brush Architectures 

      Cho, Sangho (2015-08-07)
      With recent technological improvements, fabrication of integrated circuit elements on shrinking scales is required to meet the demand for massive storage and fast data processing. As the fabrication of high resolution ...
    • Self-assembled structures, method of manufacture thereof and articles comprising the same 

      Cho, Sangho; Sun, Guorong; Wooley, Karen L.; Thackeray, James W.; Trefonas III, Peter (United States. Patent and Trademark OfficeTexas A&M University. Libraries, 2014-09-02)
      Disclosed herein is a composition comprising a graft block copolymer comprising a first block polymer; the first block polymer comprising a backbone polymer and a first graft polymer; where the first graft polymer comprises ...
    • Self-assembled structures, method of manufacture thereof and articles comprising the same 

      Cho, Sangho; Sun, Guorong; Wooley, Karen L.; Thackeray, James W.; Trefonas III, Peter (United States. Patent and Trademark OfficeTexas A&M University. Libraries, 2018-09-18)
      Disclosed herein is a graft block copolymer comprising a first block polymer; the first block polymer comprising a backbone polymer and a first graft polymer; where the first graft polymer comprises a surface energy reducing ...
    • Self-assembled structures, method of manufacture thereof and articles comprising the same 

      Cho, Sangho; Sun, Guorong; Wooley, Karen L.; Thackeray, James W.; Trefonas III, Peter (United States. Patent and Trademark OfficeTexas A&M University. Libraries, 2016-09-20)
      Disclosed herein is a graft block copolymer comprising a first block polymer; the first block polymer comprising a backbone polymer and a first graft polymer; where the first graft polymer comprises a surface energy reducing ...
    • Self-assembled structures, method of manufacture thereof and articles comprising the same 

      Cho, Sangho; Sun, Guorong; Wooley, Karen L.; Thackeray, James W.; Trefonas III, Peter (United States. Patent and Trademark OfficeTexas A&M University. Libraries, 2016-08-02)
      Disclosed herein is a photoresist composition comprising a graft block copolymer; a solvent and a photoacid generator; where the graft block copolymer comprises a first block polymer; the first block polymer comprising a ...
    • Self-assembled structures, method of manufacture thereof and articles comprising the same 

      Cho, Sangho; Sun, Guorong; Wooley, Karen L.; Thackeray, James W.; Trefonas, Peter III (United States. Patent and Trademark OfficeTexas A&M University. Libraries, 2015-12-29)
      Disclosed herein is a composition comprising a graft block copolymer comprising a copolymer comprising a backbone polymer; and a first graft polymer that comprises a surface energy reducing moiety; the first graft polymer ...