Resistivity changes in carbon-implanted Teflon
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The change in resistance of Teflon due to the implantation of carbon atoms was measured. The procedure involved implanting carbon at energies of 40 kV, 50 kV, and 140 kV using beam currents ranging from 0.5 [mu]A to 3 [mu]A for time intervals ranging from 30 minutes to over an hour. Silver paste was used to attach leads to the implanted Teflon samples, and a Fluke multimeter utilized to measure the voltage across a 10 M[Omega] resistor placed in series with the Teflon-implanted resistor. Significant deviations from Teflon's native resistance were observed and exhibited exponential decreases in resistance with increasing voltage.
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Includes bibliographical references (leaf 23).
Jackson, Matthew R. (2004). Resistivity changes in carbon-implanted Teflon. Texas A&M University. Available electronically from