Design for manufacturing (DFM) in submicron VLSI design
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As VLSI technology scales to 65nm and below, traditional communication between design and manufacturing becomes more and more inadequate. Gone are the days when designers simply pass the design GDSII ﬁle to the foundry and expect very good man¬ufacturing and parametric yield. This is largely due to the enormous challenges in the manufacturing stage as the feature size continues to shrink. Thus, the idea of DFM (Design for Manufacturing) is getting very popular. Even though there is no universally accepted deﬁnition of DFM, in my opinion, one of the major parts of DFM is to bring manufacturing information into the design stage in a way that is understood by designers. Consequently, designers can act on the information to improve both manufacturing and parametric yield. In this dissertation, I will present several attempts to reduce the gap between design and manufacturing communities: Alt-PSM aware standard cell designs, printability improve¬ment for detailed routing and the ASIC design ﬂow with litho aware static timing analysis. Experiment results show that we can greatly improve the manufacturability of the designs and we can reduce design pessimism signiﬁcantly for easier design closure.
Cao, Ke (2007). Design for manufacturing (DFM) in submicron VLSI design. Doctoral dissertation, Texas A&M University. Available electronically from