Self-assembled structures, method of manufacture thereof and articles comprising the same
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Disclosed herein is a photoresist composition comprising a graft block copolymer; a solvent and a photoacid generator; where the graft block copolymer comprises a first block polymer; the first block polymer comprising a backbone polymer and a first graft polymer; where the first graft polymer comprises a surface energy reducing moiety that comprises a halocarbon moiety or a silicon containing moiety; and a second block polymer; the second block polymer being covalently bonded to the first block; wherein the second block comprises the backbone polymer and a second graft polymer; where the second graft polymer comprises a functional group that is operative to undergo deprotection and alter the solubility of the graft block copolymer; where the graft block copolymer has a bottle brush topology.
Cho, Sangho; Sun, Guorong; Wooley, Karen L.; Thackeray, James W.; Trefonas III, Peter (2016). Self-assembled structures, method of manufacture thereof and articles comprising the same. United States. Patent and Trademark Office; Texas A&M University. Libraries. Available electronically from